
The Institute of Microstructure Physics of the Russian Academy of Sciences (via Dmitrii Kuznetsov) has laid out a long-term roadmap for domestic extreme ultraviolet (EUV) lithography tools operating at a wavelength of 11.2 nm, extending the information the organization shared last December. The new project spans from 2026, utilizing 40nm manufacturing technology, and extends to 2037, incorporating sub-10nm fabrication processes. The latest roadmap looks more realistic than some previous ones, yet it…








