‘Beyond EUV’ chipmaking tech pushes Soft X-Ray lithography closer to challenging Hyper-NA EUV — ‘B-EUV’ uses new resist chemistry to make smaller chips

Researchers at Johns Hopkins University have unveiled a new approach to chipmaking that uses lasers with a 6.5nm ~ 6.7nm wavelength — also known as Soft X-rays — that could increase the resolution of lithography tools to 5nm and below, reports Cosmos, citing a paper published in Nature. 

The scientists call their method ‘beyond-EUV’ — suggesting that their technology could replace industry-standard EUV lithography — but the researchers admit they are currently years away from building even…